Ultrathin films on copper(i) oxide water splitting photocathodes : a study on performance and stability

The utilisation of Cu2O photocathodes for photoelectrochemical water splitting requires their stabilisation due to photocorrosion in aqueous electrolytes. Ultrathin films of wide band gap semiconducting oxides deposited by atomic layer deposition (ALD) on top of cuprous oxide can perform the dual fu...

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Main Authors: Paracchino, Adriana, Mathews, Nripan, Hisatomi, Takashi, Stefik, Morgan, Tilley, S. David, Grätzel, Michael
Other Authors: School of Materials Science & Engineering
Format: Journal Article
Language:English
Published: 2013
Online Access:https://hdl.handle.net/10356/98187
http://hdl.handle.net/10220/13296
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author Paracchino, Adriana
Mathews, Nripan
Hisatomi, Takashi
Stefik, Morgan
Tilley, S. David
Grätzel, Michael
author2 School of Materials Science & Engineering
author_facet School of Materials Science & Engineering
Paracchino, Adriana
Mathews, Nripan
Hisatomi, Takashi
Stefik, Morgan
Tilley, S. David
Grätzel, Michael
author_sort Paracchino, Adriana
collection NTU
description The utilisation of Cu2O photocathodes for photoelectrochemical water splitting requires their stabilisation due to photocorrosion in aqueous electrolytes. Ultrathin films of wide band gap semiconducting oxides deposited by atomic layer deposition (ALD) on top of cuprous oxide can perform the dual function of both facilitating charge extraction (through the creation of a p–n junction) and protecting the absorber material from the aqueous electrolyte, thereby suppressing corrosion in favor of hydrogen generation. The factors that determine the photocurrent performance as well as the stability of these photoelectrodes are examined. Specifically, the influence of ALD deposition temperature, electrolyte pH, electrolyte composition as well as post-deposition annealing treatments was studied. The successful development of protective overlayers must fulfil the dual requirements of favourable band alignments as well as chemical stability. At long time scales, the deactivation of the photocathodes proceeds through etching of the amorphous overlayer, accompanied by the loss of the platinum catalyst particles. Through the deposition of a semi-crystalline TiO2 overlayer, 62% stability over 10 hours of testing has been demonstrated without re-platinization.
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spelling ntu-10356/981872020-06-01T10:26:45Z Ultrathin films on copper(i) oxide water splitting photocathodes : a study on performance and stability Paracchino, Adriana Mathews, Nripan Hisatomi, Takashi Stefik, Morgan Tilley, S. David Grätzel, Michael School of Materials Science & Engineering The utilisation of Cu2O photocathodes for photoelectrochemical water splitting requires their stabilisation due to photocorrosion in aqueous electrolytes. Ultrathin films of wide band gap semiconducting oxides deposited by atomic layer deposition (ALD) on top of cuprous oxide can perform the dual function of both facilitating charge extraction (through the creation of a p–n junction) and protecting the absorber material from the aqueous electrolyte, thereby suppressing corrosion in favor of hydrogen generation. The factors that determine the photocurrent performance as well as the stability of these photoelectrodes are examined. Specifically, the influence of ALD deposition temperature, electrolyte pH, electrolyte composition as well as post-deposition annealing treatments was studied. The successful development of protective overlayers must fulfil the dual requirements of favourable band alignments as well as chemical stability. At long time scales, the deactivation of the photocathodes proceeds through etching of the amorphous overlayer, accompanied by the loss of the platinum catalyst particles. Through the deposition of a semi-crystalline TiO2 overlayer, 62% stability over 10 hours of testing has been demonstrated without re-platinization. 2013-09-04T06:01:27Z 2019-12-06T19:51:54Z 2013-09-04T06:01:27Z 2019-12-06T19:51:54Z 2012 2012 Journal Article Paracchino, A., Mathews, N., Hisatomi, T., Stefik, M., Tilley, S. D., & Grätzel, M. (2012). Ultrathin films on copper(i) oxide water splitting photocathodes: a study on performance and stability. Energy & Environmental Science, 5(9), 8673-8681. https://hdl.handle.net/10356/98187 http://hdl.handle.net/10220/13296 10.1039/c2ee22063f en Energy & environmental science
spellingShingle Paracchino, Adriana
Mathews, Nripan
Hisatomi, Takashi
Stefik, Morgan
Tilley, S. David
Grätzel, Michael
Ultrathin films on copper(i) oxide water splitting photocathodes : a study on performance and stability
title Ultrathin films on copper(i) oxide water splitting photocathodes : a study on performance and stability
title_full Ultrathin films on copper(i) oxide water splitting photocathodes : a study on performance and stability
title_fullStr Ultrathin films on copper(i) oxide water splitting photocathodes : a study on performance and stability
title_full_unstemmed Ultrathin films on copper(i) oxide water splitting photocathodes : a study on performance and stability
title_short Ultrathin films on copper(i) oxide water splitting photocathodes : a study on performance and stability
title_sort ultrathin films on copper i oxide water splitting photocathodes a study on performance and stability
url https://hdl.handle.net/10356/98187
http://hdl.handle.net/10220/13296
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