Percolative model and thermodynamic analysis of oxygen-ion-mediated resistive switching

We present a statistical percolation model for retention lifetime assessment of resistive switching memory at the high-resistance state and correlate it to the soft breakdown phenomenon in ultrathin gate dielectrics. Electrical characterization in the low-resistance state shows that the location of...

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Main Authors: Raghavan, Nagarajan, Pey, Kin Leong, Wu, Xing, Liu, Wenhu, Bosman, Michel
Other Authors: School of Electrical and Electronic Engineering
Format: Journal Article
Language:English
Published: 2013
Subjects:
Online Access:https://hdl.handle.net/10356/98448
http://hdl.handle.net/10220/11336
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author Raghavan, Nagarajan
Pey, Kin Leong
Wu, Xing
Liu, Wenhu
Bosman, Michel
author2 School of Electrical and Electronic Engineering
author_facet School of Electrical and Electronic Engineering
Raghavan, Nagarajan
Pey, Kin Leong
Wu, Xing
Liu, Wenhu
Bosman, Michel
author_sort Raghavan, Nagarajan
collection NTU
description We present a statistical percolation model for retention lifetime assessment of resistive switching memory at the high-resistance state and correlate it to the soft breakdown phenomenon in ultrathin gate dielectrics. Electrical characterization in the low-resistance state shows that the location of oxygen-vacancy-based conductive filaments is almost randomly distributed and the trap generation rate across the oxide after reset transition is uniform. The constraints for the range of read voltages in the low and high conduction states, governed by the area of the device and the thermodynamics of oxygen ion transport, are presented.
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spelling ntu-10356/984482020-03-07T14:00:30Z Percolative model and thermodynamic analysis of oxygen-ion-mediated resistive switching Raghavan, Nagarajan Pey, Kin Leong Wu, Xing Liu, Wenhu Bosman, Michel School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering We present a statistical percolation model for retention lifetime assessment of resistive switching memory at the high-resistance state and correlate it to the soft breakdown phenomenon in ultrathin gate dielectrics. Electrical characterization in the low-resistance state shows that the location of oxygen-vacancy-based conductive filaments is almost randomly distributed and the trap generation rate across the oxide after reset transition is uniform. The constraints for the range of read voltages in the low and high conduction states, governed by the area of the device and the thermodynamics of oxygen ion transport, are presented. 2013-07-12T07:43:09Z 2019-12-06T19:55:21Z 2013-07-12T07:43:09Z 2019-12-06T19:55:21Z 2012 2012 Journal Article https://hdl.handle.net/10356/98448 http://hdl.handle.net/10220/11336 10.1109/LED.2012.2187170 en IEEE electron device letters © 2012 IEEE.
spellingShingle DRNTU::Engineering::Electrical and electronic engineering
Raghavan, Nagarajan
Pey, Kin Leong
Wu, Xing
Liu, Wenhu
Bosman, Michel
Percolative model and thermodynamic analysis of oxygen-ion-mediated resistive switching
title Percolative model and thermodynamic analysis of oxygen-ion-mediated resistive switching
title_full Percolative model and thermodynamic analysis of oxygen-ion-mediated resistive switching
title_fullStr Percolative model and thermodynamic analysis of oxygen-ion-mediated resistive switching
title_full_unstemmed Percolative model and thermodynamic analysis of oxygen-ion-mediated resistive switching
title_short Percolative model and thermodynamic analysis of oxygen-ion-mediated resistive switching
title_sort percolative model and thermodynamic analysis of oxygen ion mediated resistive switching
topic DRNTU::Engineering::Electrical and electronic engineering
url https://hdl.handle.net/10356/98448
http://hdl.handle.net/10220/11336
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