Effect of excimer laser annealing on the silicon nanocrystals embedded in silicon-rich silicon nitride film
The investigations of silicon-rich silicon nitride film grown by plasma-enhanced chemical vapor deposition and then annealed by excimer laser have been carried out systematically. The surface roughness and the crystallization of the films have significantly been improved after the excimer laser anne...
| Main Authors: | , , , , , , , , |
|---|---|
| Other Authors: | |
| Format: | Journal Article |
| Language: | English |
| Published: |
2013
|
| Online Access: | https://hdl.handle.net/10356/98917 http://hdl.handle.net/10220/12544 |
| _version_ | 1826130236312387584 |
|---|---|
| author | Chen, Rui Qi, D. F. Ruan, Y. J. Pan, S. W. Chen, S. Y. Xie, Sheng Li, Cheng Lai, H. K. Sun, H. D. |
| author2 | School of Physical and Mathematical Sciences |
| author_facet | School of Physical and Mathematical Sciences Chen, Rui Qi, D. F. Ruan, Y. J. Pan, S. W. Chen, S. Y. Xie, Sheng Li, Cheng Lai, H. K. Sun, H. D. |
| author_sort | Chen, Rui |
| collection | NTU |
| description | The investigations of silicon-rich silicon nitride film grown by plasma-enhanced chemical vapor deposition and then annealed by excimer laser have been carried out systematically. The surface roughness and the crystallization of the films have significantly been improved after the excimer laser annealing. The samples demonstrate visible photoluminescence emission under optical excitation at room temperature. It is found that the emission peak energy as well as emission intensity changes with laser annealing conditions, and the relevant mechanism is discussed in detail. Our investigation exhibits the size controllability of silicon nanocrystals embedded in the silicon nitride film, which implies promising applications in optoelectronic devices such as light-emitting diodes and solar cells. |
| first_indexed | 2024-10-01T07:53:10Z |
| format | Journal Article |
| id | ntu-10356/98917 |
| institution | Nanyang Technological University |
| language | English |
| last_indexed | 2024-10-01T07:53:10Z |
| publishDate | 2013 |
| record_format | dspace |
| spelling | ntu-10356/989172020-03-07T12:34:44Z Effect of excimer laser annealing on the silicon nanocrystals embedded in silicon-rich silicon nitride film Chen, Rui Qi, D. F. Ruan, Y. J. Pan, S. W. Chen, S. Y. Xie, Sheng Li, Cheng Lai, H. K. Sun, H. D. School of Physical and Mathematical Sciences The investigations of silicon-rich silicon nitride film grown by plasma-enhanced chemical vapor deposition and then annealed by excimer laser have been carried out systematically. The surface roughness and the crystallization of the films have significantly been improved after the excimer laser annealing. The samples demonstrate visible photoluminescence emission under optical excitation at room temperature. It is found that the emission peak energy as well as emission intensity changes with laser annealing conditions, and the relevant mechanism is discussed in detail. Our investigation exhibits the size controllability of silicon nanocrystals embedded in the silicon nitride film, which implies promising applications in optoelectronic devices such as light-emitting diodes and solar cells. 2013-07-31T03:02:53Z 2019-12-06T20:01:07Z 2013-07-31T03:02:53Z 2019-12-06T20:01:07Z 2011 2011 Journal Article Chen, R., Qi, D. F., Ruan, Y. J., Pan, S. W., Chen, S. Y., Xie, S., Li, C., Lai, H. K.,& Sun, H. D. (2012). Effect of excimer laser annealing on the silicon nanocrystals embedded in silicon-rich silicon nitride film. Applied Physics A, 106(1), 251-255. https://hdl.handle.net/10356/98917 http://hdl.handle.net/10220/12544 10.1007/s00339-011-6592-9 en Applied physics A |
| spellingShingle | Chen, Rui Qi, D. F. Ruan, Y. J. Pan, S. W. Chen, S. Y. Xie, Sheng Li, Cheng Lai, H. K. Sun, H. D. Effect of excimer laser annealing on the silicon nanocrystals embedded in silicon-rich silicon nitride film |
| title | Effect of excimer laser annealing on the silicon nanocrystals embedded in silicon-rich silicon nitride film |
| title_full | Effect of excimer laser annealing on the silicon nanocrystals embedded in silicon-rich silicon nitride film |
| title_fullStr | Effect of excimer laser annealing on the silicon nanocrystals embedded in silicon-rich silicon nitride film |
| title_full_unstemmed | Effect of excimer laser annealing on the silicon nanocrystals embedded in silicon-rich silicon nitride film |
| title_short | Effect of excimer laser annealing on the silicon nanocrystals embedded in silicon-rich silicon nitride film |
| title_sort | effect of excimer laser annealing on the silicon nanocrystals embedded in silicon rich silicon nitride film |
| url | https://hdl.handle.net/10356/98917 http://hdl.handle.net/10220/12544 |
| work_keys_str_mv | AT chenrui effectofexcimerlaserannealingonthesiliconnanocrystalsembeddedinsiliconrichsiliconnitridefilm AT qidf effectofexcimerlaserannealingonthesiliconnanocrystalsembeddedinsiliconrichsiliconnitridefilm AT ruanyj effectofexcimerlaserannealingonthesiliconnanocrystalsembeddedinsiliconrichsiliconnitridefilm AT pansw effectofexcimerlaserannealingonthesiliconnanocrystalsembeddedinsiliconrichsiliconnitridefilm AT chensy effectofexcimerlaserannealingonthesiliconnanocrystalsembeddedinsiliconrichsiliconnitridefilm AT xiesheng effectofexcimerlaserannealingonthesiliconnanocrystalsembeddedinsiliconrichsiliconnitridefilm AT licheng effectofexcimerlaserannealingonthesiliconnanocrystalsembeddedinsiliconrichsiliconnitridefilm AT laihk effectofexcimerlaserannealingonthesiliconnanocrystalsembeddedinsiliconrichsiliconnitridefilm AT sunhd effectofexcimerlaserannealingonthesiliconnanocrystalsembeddedinsiliconrichsiliconnitridefilm |