Summary: | ABSTRACT
Surface modificationof graphitefT702has been done by mean of Cu electrodeposition. This research aims to
study the effect of Cu electrodepositionon photocatalyticenhancing of Ti02.Electrodepositionhas been done using
CUS04 0,4 M as the electrolyte at controlled current. The XRD pattern of modified Ti02 thin film on graphite
substrate exhibited new peaks at 29= 43-440and 29= 50-510that have been identified as Cu with crystal cubic
system, face-centered crystal lattice and crystallite size of 26-30 nm. CTABr still remains in the material as
impurities. Meanwhile, based on morphological analysis, Cu particles are dissipated in the pore of thin film.
Graphite/TiO~Cuhas higher photoconversionefficiency than graphite/Ti02.
Keywords: semiconductor, graphite/Ti02> Cu electrodeposition
|