Theoretical study of atomic level understanding of the reactive ion etching (RIE)
We consider cluster model of FeNi4 cluster (as material target) where Fe ion is surrounded by four Ni ions in order to understand the mechanisms involved in the reactive ion etching (RIE) processes on magnetic surfaces(e.g., FeNi surface). By considering CO ions as reactive gases, we etch Fe ion fro...
| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
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American Scientific Publishers
2012
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| Subjects: | |
| Online Access: | http://irep.iium.edu.my/28502/1/Theoretical_Study_of_Atomic_Level_Understanding_of_the_Reactive_Ion_Etching_%28RIE%29.pdf |
| _version_ | 1825647102247567360 |
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| author | Muhida, Rifki Rahman, Md. Mamudur Chowdhury, Md. Sazzad Hossien Muhida, Riza Zainuddin, Hishamuddin Zakaria, Azmi Kasai, Hideaki |
| author_facet | Muhida, Rifki Rahman, Md. Mamudur Chowdhury, Md. Sazzad Hossien Muhida, Riza Zainuddin, Hishamuddin Zakaria, Azmi Kasai, Hideaki |
| author_sort | Muhida, Rifki |
| collection | IIUM |
| description | We consider cluster model of FeNi4 cluster (as material target) where Fe ion is surrounded by four Ni ions in order to understand the mechanisms involved in the reactive ion etching (RIE) processes on magnetic surfaces(e.g., FeNi surface). By considering CO ions as reactive gases, we etch Fe ion from the cluster surface providing ion pentacarbonyl, i.e., Fe(CO)5. By density functional theory based first principle calculations, we calculate the potential energy surface(PES) of the system and describe the mechanism of the reaction. Based on the two chosen pathways for initial and final states, we show that the RIE processes follow the pathway that gives us minimum energy. |
| first_indexed | 2024-03-05T23:12:38Z |
| format | Article |
| id | oai:generic.eprints.org:28502 |
| institution | International Islamic University Malaysia |
| language | English |
| last_indexed | 2024-03-13T19:07:02Z |
| publishDate | 2012 |
| publisher | American Scientific Publishers |
| record_format | dspace |
| spelling | oai:generic.eprints.org:285022013-02-13T13:09:18Z http://irep.iium.edu.my/28502/ Theoretical study of atomic level understanding of the reactive ion etching (RIE) Muhida, Rifki Rahman, Md. Mamudur Chowdhury, Md. Sazzad Hossien Muhida, Riza Zainuddin, Hishamuddin Zakaria, Azmi Kasai, Hideaki QC Physics We consider cluster model of FeNi4 cluster (as material target) where Fe ion is surrounded by four Ni ions in order to understand the mechanisms involved in the reactive ion etching (RIE) processes on magnetic surfaces(e.g., FeNi surface). By considering CO ions as reactive gases, we etch Fe ion from the cluster surface providing ion pentacarbonyl, i.e., Fe(CO)5. By density functional theory based first principle calculations, we calculate the potential energy surface(PES) of the system and describe the mechanism of the reaction. Based on the two chosen pathways for initial and final states, we show that the RIE processes follow the pathway that gives us minimum energy. American Scientific Publishers 2012-08-09 Article PeerReviewed application/pdf en http://irep.iium.edu.my/28502/1/Theoretical_Study_of_Atomic_Level_Understanding_of_the_Reactive_Ion_Etching_%28RIE%29.pdf Muhida, Rifki and Rahman, Md. Mamudur and Chowdhury, Md. Sazzad Hossien and Muhida, Riza and Zainuddin, Hishamuddin and Zakaria, Azmi and Kasai, Hideaki (2012) Theoretical study of atomic level understanding of the reactive ion etching (RIE). Journal of Computational and Theoretical Nanoscience, 9 (8). pp. 1067-1069. ISSN 1546-1955 (P) 1546-1963 (O) http://www.aspbs.com/ctn/ doi:10.1166/jctn.2012.2144 |
| spellingShingle | QC Physics Muhida, Rifki Rahman, Md. Mamudur Chowdhury, Md. Sazzad Hossien Muhida, Riza Zainuddin, Hishamuddin Zakaria, Azmi Kasai, Hideaki Theoretical study of atomic level understanding of the reactive ion etching (RIE) |
| title | Theoretical study of atomic level understanding of the reactive ion etching (RIE) |
| title_full | Theoretical study of atomic level understanding of the reactive ion etching (RIE) |
| title_fullStr | Theoretical study of atomic level understanding of the reactive ion etching (RIE) |
| title_full_unstemmed | Theoretical study of atomic level understanding of the reactive ion etching (RIE) |
| title_short | Theoretical study of atomic level understanding of the reactive ion etching (RIE) |
| title_sort | theoretical study of atomic level understanding of the reactive ion etching rie |
| topic | QC Physics |
| url | http://irep.iium.edu.my/28502/1/Theoretical_Study_of_Atomic_Level_Understanding_of_the_Reactive_Ion_Etching_%28RIE%29.pdf |
| work_keys_str_mv | AT muhidarifki theoreticalstudyofatomiclevelunderstandingofthereactiveionetchingrie AT rahmanmdmamudur theoreticalstudyofatomiclevelunderstandingofthereactiveionetchingrie AT chowdhurymdsazzadhossien theoreticalstudyofatomiclevelunderstandingofthereactiveionetchingrie AT muhidariza theoreticalstudyofatomiclevelunderstandingofthereactiveionetchingrie AT zainuddinhishamuddin theoreticalstudyofatomiclevelunderstandingofthereactiveionetchingrie AT zakariaazmi theoreticalstudyofatomiclevelunderstandingofthereactiveionetchingrie AT kasaihideaki theoreticalstudyofatomiclevelunderstandingofthereactiveionetchingrie |