Theoretical study of atomic level understanding of the reactive ion etching (RIE)
We consider cluster model of FeNi4 cluster (as material target) where Fe ion is surrounded by four Ni ions in order to understand the mechanisms involved in the reactive ion etching (RIE) processes on magnetic surfaces(e.g., FeNi surface). By considering CO ions as reactive gases, we etch Fe ion fro...
| Main Authors: | , , , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
American Scientific Publishers
2012
|
| Subjects: | |
| Online Access: | http://irep.iium.edu.my/28502/1/Theoretical_Study_of_Atomic_Level_Understanding_of_the_Reactive_Ion_Etching_%28RIE%29.pdf |