Development of low normal force contact using electro fine forming and lithography technology
This new technology is realized by Photo Resist Lithography and NiCo Electro Fine Forming Process, and enables the design of a small contact spring for applications requiring high density, high speed and high durability. The evaluation result proved the capability of Low Normal Force (0.10N-0.15N at...
| Main Authors: | , , , , |
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| Format: | Proceeding Paper |
| Language: | English English |
| Published: |
2008
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| Subjects: | |
| Online Access: | http://irep.iium.edu.my/33190/1/Development_of_Low_Normal_Force_Contact_Using_Electro_Fine_Forming_and_Lithography_Technology.pdf http://irep.iium.edu.my/33190/4/TE_Technical_Conference_2008.jpg |
| _version_ | 1825647624724676608 |
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| author | Bhuiyan, Moinul Yamada, Shinji Kurokawa, Noriharu Sakamoto, Katsuhiko Takemasa, Eiichiro |
| author_facet | Bhuiyan, Moinul Yamada, Shinji Kurokawa, Noriharu Sakamoto, Katsuhiko Takemasa, Eiichiro |
| author_sort | Bhuiyan, Moinul |
| collection | IIUM |
| description | This new technology is realized by Photo Resist Lithography and NiCo Electro Fine Forming Process, and enables the design of a small contact spring for applications requiring high density, high speed and high durability. The evaluation result proved the capability of Low Normal Force (0.10N-0.15N at 0.3mm) at contact point (5μm radius), durability of 100,000 contact cycles (less than 50mΩ). |
| first_indexed | 2024-03-05T23:20:21Z |
| format | Proceeding Paper |
| id | oai:generic.eprints.org:33190 |
| institution | International Islamic University Malaysia |
| language | English English |
| last_indexed | 2024-03-05T23:20:21Z |
| publishDate | 2008 |
| record_format | dspace |
| spelling | oai:generic.eprints.org:331902013-12-20T07:34:23Z http://irep.iium.edu.my/33190/ Development of low normal force contact using electro fine forming and lithography technology Bhuiyan, Moinul Yamada, Shinji Kurokawa, Noriharu Sakamoto, Katsuhiko Takemasa, Eiichiro TA401 Materials of engineering and construction This new technology is realized by Photo Resist Lithography and NiCo Electro Fine Forming Process, and enables the design of a small contact spring for applications requiring high density, high speed and high durability. The evaluation result proved the capability of Low Normal Force (0.10N-0.15N at 0.3mm) at contact point (5μm radius), durability of 100,000 contact cycles (less than 50mΩ). 2008-10 Proceeding Paper PeerReviewed application/pdf en http://irep.iium.edu.my/33190/1/Development_of_Low_Normal_Force_Contact_Using_Electro_Fine_Forming_and_Lithography_Technology.pdf application/pdf en http://irep.iium.edu.my/33190/4/TE_Technical_Conference_2008.jpg Bhuiyan, Moinul and Yamada, Shinji and Kurokawa, Noriharu and Sakamoto, Katsuhiko and Takemasa, Eiichiro (2008) Development of low normal force contact using electro fine forming and lithography technology. In: Tyco Electronics Technical Conference 2008, 14-16 Oct 2008, Shanghai, China. (Unpublished) http://www.te.com/en/home.html |
| spellingShingle | TA401 Materials of engineering and construction Bhuiyan, Moinul Yamada, Shinji Kurokawa, Noriharu Sakamoto, Katsuhiko Takemasa, Eiichiro Development of low normal force contact using electro fine forming and lithography technology |
| title | Development of low normal force contact using electro fine forming and lithography technology |
| title_full | Development of low normal force contact using electro fine forming and lithography technology |
| title_fullStr | Development of low normal force contact using electro fine forming and lithography technology |
| title_full_unstemmed | Development of low normal force contact using electro fine forming and lithography technology |
| title_short | Development of low normal force contact using electro fine forming and lithography technology |
| title_sort | development of low normal force contact using electro fine forming and lithography technology |
| topic | TA401 Materials of engineering and construction |
| url | http://irep.iium.edu.my/33190/1/Development_of_Low_Normal_Force_Contact_Using_Electro_Fine_Forming_and_Lithography_Technology.pdf http://irep.iium.edu.my/33190/4/TE_Technical_Conference_2008.jpg |
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