RF magnetron sputtered YSZ thin film: Fabrication and characterizations

In order to obtain high ionic conductivity of a solid electrolyte at intermediate temperatures, a very thin dense film is crucial due to its reduced ohmic losses. This work describes the fabrication of yttria-stablized zirconia (8YSZ) thin films using radio frequency (RF) magnetron sputtering method...

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Main Authors: Meskon, Shahrul Razi, Sutjipto, Agus Geter Edy, Ani, Mohd Hanafi, Othman, Raihan
Format: Proceeding Paper
Language:English
Published: 2010
Subjects:
Online Access:http://irep.iium.edu.my/6720/1/ICFMD2010_Shahrul.pdf
_version_ 1825644821475229696
author Meskon, Shahrul Razi
Sutjipto, Agus Geter Edy
Ani, Mohd Hanafi
Othman, Raihan
author_facet Meskon, Shahrul Razi
Sutjipto, Agus Geter Edy
Ani, Mohd Hanafi
Othman, Raihan
author_sort Meskon, Shahrul Razi
collection IIUM
description In order to obtain high ionic conductivity of a solid electrolyte at intermediate temperatures, a very thin dense film is crucial due to its reduced ohmic losses. This work describes the fabrication of yttria-stablized zirconia (8YSZ) thin films using radio frequency (RF) magnetron sputtering method. The thin films were deposited on carbon paint coated stainless steel foils with varying substrate temperatures (Ts) of 150, 200, 250 and 300°C, while other sputtering parameters i.e. argon gas flow rate, RF power and deposition time were fixed. The sputtering target was sintered YSZ pellets. The deposited thin films thickness ranges from 300 nm to 2 μm as determined from the scanning electron microscopy. Phase analysis using the X-ray diffraction (XRD) revealed monoclinic, tetragonal and cubic phases of zirconia, and yttria peaks. AC impedance spectroscopy was conducted to measure the bulk resistance of the thin films. Through increasing substrate temperatures, the bulk resistance decreases from 13.76 k for Ts of 150C to 1.913 k for Ts of 300C.
first_indexed 2024-03-05T22:38:28Z
format Proceeding Paper
id oai:generic.eprints.org:6720
institution International Islamic University Malaysia
language English
last_indexed 2024-03-05T22:38:28Z
publishDate 2010
record_format dspace
spelling oai:generic.eprints.org:67202011-12-19T06:00:45Z http://irep.iium.edu.my/6720/ RF magnetron sputtered YSZ thin film: Fabrication and characterizations Meskon, Shahrul Razi Sutjipto, Agus Geter Edy Ani, Mohd Hanafi Othman, Raihan TA2001 Plasma engineering. Applied plasma dynamics TJ807 Renewable energy sources TK2896 Production of electricity by direct energy conversion In order to obtain high ionic conductivity of a solid electrolyte at intermediate temperatures, a very thin dense film is crucial due to its reduced ohmic losses. This work describes the fabrication of yttria-stablized zirconia (8YSZ) thin films using radio frequency (RF) magnetron sputtering method. The thin films were deposited on carbon paint coated stainless steel foils with varying substrate temperatures (Ts) of 150, 200, 250 and 300°C, while other sputtering parameters i.e. argon gas flow rate, RF power and deposition time were fixed. The sputtering target was sintered YSZ pellets. The deposited thin films thickness ranges from 300 nm to 2 μm as determined from the scanning electron microscopy. Phase analysis using the X-ray diffraction (XRD) revealed monoclinic, tetragonal and cubic phases of zirconia, and yttria peaks. AC impedance spectroscopy was conducted to measure the bulk resistance of the thin films. Through increasing substrate temperatures, the bulk resistance decreases from 13.76 k for Ts of 150C to 1.913 k for Ts of 300C. 2010-06-14 Proceeding Paper NonPeerReviewed application/pdf en http://irep.iium.edu.my/6720/1/ICFMD2010_Shahrul.pdf Meskon, Shahrul Razi and Sutjipto, Agus Geter Edy and Ani, Mohd Hanafi and Othman, Raihan (2010) RF magnetron sputtered YSZ thin film: Fabrication and characterizations. In: 3rd International Conference on Functional Materials and Devices 2010, 13-17 June 2010, Kuala Terengganu, Terengganu, Malaysia. (Unpublished) http://umconference.um.edu.my/ICFMD2010
spellingShingle TA2001 Plasma engineering. Applied plasma dynamics
TJ807 Renewable energy sources
TK2896 Production of electricity by direct energy conversion
Meskon, Shahrul Razi
Sutjipto, Agus Geter Edy
Ani, Mohd Hanafi
Othman, Raihan
RF magnetron sputtered YSZ thin film: Fabrication and characterizations
title RF magnetron sputtered YSZ thin film: Fabrication and characterizations
title_full RF magnetron sputtered YSZ thin film: Fabrication and characterizations
title_fullStr RF magnetron sputtered YSZ thin film: Fabrication and characterizations
title_full_unstemmed RF magnetron sputtered YSZ thin film: Fabrication and characterizations
title_short RF magnetron sputtered YSZ thin film: Fabrication and characterizations
title_sort rf magnetron sputtered ysz thin film fabrication and characterizations
topic TA2001 Plasma engineering. Applied plasma dynamics
TJ807 Renewable energy sources
TK2896 Production of electricity by direct energy conversion
url http://irep.iium.edu.my/6720/1/ICFMD2010_Shahrul.pdf
work_keys_str_mv AT meskonshahrulrazi rfmagnetronsputteredyszthinfilmfabricationandcharacterizations
AT sutjiptoagusgeteredy rfmagnetronsputteredyszthinfilmfabricationandcharacterizations
AT animohdhanafi rfmagnetronsputteredyszthinfilmfabricationandcharacterizations
AT othmanraihan rfmagnetronsputteredyszthinfilmfabricationandcharacterizations