Chemical modification and micropatterning of Si(100) with oligonucleotides

A method for the reliable attachment of oligonucleotides to silicon (1 0 0) surfaces in patterns is described. UV light exposure of silicon (1 0 0) coated with alkenes functionalized with carboxylic acid groups and derivatives results in covalent attachment to the silicon surface. The carboxyl-termi...

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Main Authors: Yin, H, Brown, T, Greef, R, Wilkinson, J, Melvin, T
Format: Journal article
Language:English
Published: 2004
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author Yin, H
Brown, T
Greef, R
Wilkinson, J
Melvin, T
author_facet Yin, H
Brown, T
Greef, R
Wilkinson, J
Melvin, T
author_sort Yin, H
collection OXFORD
description A method for the reliable attachment of oligonucleotides to silicon (1 0 0) surfaces in patterns is described. UV light exposure of silicon (1 0 0) coated with alkenes functionalized with carboxylic acid groups and derivatives results in covalent attachment to the silicon surface. The carboxyl-terminated (and derivatives) surfaces act as a substrate for the chemistry of the subsequent attachment of oligonucleotides. Illustrated are our results gained for optimisation of the surface attachment chemistry and the characterisation of the surface with scanning electron microscopy, epifluorescence microscopy and ellipsometry. © 2004 Elsevier B.V. All rights reserved.
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spelling oxford-uuid:01424077-0927-4efe-b6d1-cd1d36b1fc2a2022-03-26T08:33:56ZChemical modification and micropatterning of Si(100) with oligonucleotidesJournal articlehttp://purl.org/coar/resource_type/c_dcae04bcuuid:01424077-0927-4efe-b6d1-cd1d36b1fc2aEnglishSymplectic Elements at Oxford2004Yin, HBrown, TGreef, RWilkinson, JMelvin, TA method for the reliable attachment of oligonucleotides to silicon (1 0 0) surfaces in patterns is described. UV light exposure of silicon (1 0 0) coated with alkenes functionalized with carboxylic acid groups and derivatives results in covalent attachment to the silicon surface. The carboxyl-terminated (and derivatives) surfaces act as a substrate for the chemistry of the subsequent attachment of oligonucleotides. Illustrated are our results gained for optimisation of the surface attachment chemistry and the characterisation of the surface with scanning electron microscopy, epifluorescence microscopy and ellipsometry. © 2004 Elsevier B.V. All rights reserved.
spellingShingle Yin, H
Brown, T
Greef, R
Wilkinson, J
Melvin, T
Chemical modification and micropatterning of Si(100) with oligonucleotides
title Chemical modification and micropatterning of Si(100) with oligonucleotides
title_full Chemical modification and micropatterning of Si(100) with oligonucleotides
title_fullStr Chemical modification and micropatterning of Si(100) with oligonucleotides
title_full_unstemmed Chemical modification and micropatterning of Si(100) with oligonucleotides
title_short Chemical modification and micropatterning of Si(100) with oligonucleotides
title_sort chemical modification and micropatterning of si 100 with oligonucleotides
work_keys_str_mv AT yinh chemicalmodificationandmicropatterningofsi100witholigonucleotides
AT brownt chemicalmodificationandmicropatterningofsi100witholigonucleotides
AT greefr chemicalmodificationandmicropatterningofsi100witholigonucleotides
AT wilkinsonj chemicalmodificationandmicropatterningofsi100witholigonucleotides
AT melvint chemicalmodificationandmicropatterningofsi100witholigonucleotides