LASER-INDUCED FLUORESCENCE DETECTION OF CF AND CF2 RADICALS IN A CF4/O2 PLASMA

Laser induced fluorescence has been used to detect ground-state CF and CF2 radicals in a CF4/O2 plasma etching reactor. Measurements are reported of the spatial variation of CF2 concentrations, of the CF radical rotational state distributions, and of the variation of both species with O2 content of...

Полное описание

Библиографические подробности
Главные авторы: Booth, J, Hancock, G, Perry, N
Формат: Journal article
Язык:English
Опубликовано: 1987
Описание
Итог:Laser induced fluorescence has been used to detect ground-state CF and CF2 radicals in a CF4/O2 plasma etching reactor. Measurements are reported of the spatial variation of CF2 concentrations, of the CF radical rotational state distributions, and of the variation of both species with O2 content of the plasma.