LASER-INDUCED FLUORESCENCE DETECTION OF CF AND CF2 RADICALS IN A CF4/O2 PLASMA

Laser induced fluorescence has been used to detect ground-state CF and CF2 radicals in a CF4/O2 plasma etching reactor. Measurements are reported of the spatial variation of CF2 concentrations, of the CF radical rotational state distributions, and of the variation of both species with O2 content of...

詳細記述

書誌詳細
主要な著者: Booth, J, Hancock, G, Perry, N
フォーマット: Journal article
言語:English
出版事項: 1987

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