THERMAL AND PHOTOCHEMICAL VAPOR-DEPOSITION OF FE FROM FE(CO)5 ON SI(100)
The adsorption of Fe(CO)5 on Si(100) has been studied using AES and TDS techniques; pyrolytic and photochemical decomposition reactions have been examined. The adsorbate is found to undergo a dissociative, activated adsorption reaction above 300 K resulting in formation of an Fe film in which the ca...
| Main Authors: | , |
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| Format: | Journal article |
| Language: | English |
| Published: |
1989
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| Summary: | The adsorption of Fe(CO)5 on Si(100) has been studied using AES and TDS techniques; pyrolytic and photochemical decomposition reactions have been examined. The adsorbate is found to undergo a dissociative, activated adsorption reaction above 300 K resulting in formation of an Fe film in which the carbon and oxygen concentrations are a few atomic percent. The sticking probability associated with the reaction is in the range 10-3-10-4 at 500 K and the apparent activation energy is 26 ± 2 kJ mol-1. UV photolysis of adsorbed Fe(CO)5 is found to produce a film of similar purity. Surface-to-bulk transport of Fe is observed above 400 K. The kinetic data can be described on the basis of a model where the rate is controlled by bulk solubility levels and diffusion coefficients for Fe in Si. The situation is contrasted to that observed at high temperatures where silicide formation generates a diffusion barrier. Fe(CO)5 is found to adsorb significantly more strongly on the deposited Fe film than the Si(100) substrate itself. © 1989. |
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