Deposition of SrZrO3 thin films using liquid delivery metal-organic chemical vapor deposition

Proton-conductive SrZrO3 films were successfully deposited on Pt/SiOx/Si and porous stainless-steel substrates by liquid delivery metalorganic chemical vapor deposition (LD-MOCVD). The as-deposited films deposited on the Pt/SiOx/Si substrate at 600 °C showed good crystallinity and post-annealing at...

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Những tác giả chính: Uchiyama, K, Sakairi, H, Shiosaki, T, Kariya, T, Ikeda, H, Yanagimoto, K, Yamada, Y, Nakayama, A
Định dạng: Journal article
Ngôn ngữ:English
Được phát hành: 2009
Miêu tả
Tóm tắt:Proton-conductive SrZrO3 films were successfully deposited on Pt/SiOx/Si and porous stainless-steel substrates by liquid delivery metalorganic chemical vapor deposition (LD-MOCVD). The as-deposited films deposited on the Pt/SiOx/Si substrate at 600 °C showed good crystallinity and post-annealing at temperatures below 800 °C resulted in improved crystallinity. A 200-nm-thick film deposited on the porous stainless-steel substrate was flat and solid and did not show any gas leakage. We consider this deposition technique to be applicable for the fabrication of a new solid oxide fuel cell structure with intermediate-temperature operation. © 2009 The Japan Society of Applied Physics.