Deposition of SrZrO3 thin films using liquid delivery metal-organic chemical vapor deposition
Proton-conductive SrZrO3 films were successfully deposited on Pt/SiOx/Si and porous stainless-steel substrates by liquid delivery metalorganic chemical vapor deposition (LD-MOCVD). The as-deposited films deposited on the Pt/SiOx/Si substrate at 600 °C showed good crystallinity and post-annealing at...
| Main Authors: | , , , , , , , |
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| Format: | Journal article |
| Language: | English |
| Published: |
2009
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| _version_ | 1797054170304348160 |
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| author | Uchiyama, K Sakairi, H Shiosaki, T Kariya, T Ikeda, H Yanagimoto, K Yamada, Y Nakayama, A |
| author_facet | Uchiyama, K Sakairi, H Shiosaki, T Kariya, T Ikeda, H Yanagimoto, K Yamada, Y Nakayama, A |
| author_sort | Uchiyama, K |
| collection | OXFORD |
| description | Proton-conductive SrZrO3 films were successfully deposited on Pt/SiOx/Si and porous stainless-steel substrates by liquid delivery metalorganic chemical vapor deposition (LD-MOCVD). The as-deposited films deposited on the Pt/SiOx/Si substrate at 600 °C showed good crystallinity and post-annealing at temperatures below 800 °C resulted in improved crystallinity. A 200-nm-thick film deposited on the porous stainless-steel substrate was flat and solid and did not show any gas leakage. We consider this deposition technique to be applicable for the fabrication of a new solid oxide fuel cell structure with intermediate-temperature operation. © 2009 The Japan Society of Applied Physics. |
| first_indexed | 2024-03-06T18:53:27Z |
| format | Journal article |
| id | oxford-uuid:110596b0-3d2c-4d43-9bb9-aa4a3a2c8f7e |
| institution | University of Oxford |
| language | English |
| last_indexed | 2024-03-06T18:53:27Z |
| publishDate | 2009 |
| record_format | dspace |
| spelling | oxford-uuid:110596b0-3d2c-4d43-9bb9-aa4a3a2c8f7e2022-03-26T09:59:52ZDeposition of SrZrO3 thin films using liquid delivery metal-organic chemical vapor depositionJournal articlehttp://purl.org/coar/resource_type/c_dcae04bcuuid:110596b0-3d2c-4d43-9bb9-aa4a3a2c8f7eEnglishSymplectic Elements at Oxford2009Uchiyama, KSakairi, HShiosaki, TKariya, TIkeda, HYanagimoto, KYamada, YNakayama, AProton-conductive SrZrO3 films were successfully deposited on Pt/SiOx/Si and porous stainless-steel substrates by liquid delivery metalorganic chemical vapor deposition (LD-MOCVD). The as-deposited films deposited on the Pt/SiOx/Si substrate at 600 °C showed good crystallinity and post-annealing at temperatures below 800 °C resulted in improved crystallinity. A 200-nm-thick film deposited on the porous stainless-steel substrate was flat and solid and did not show any gas leakage. We consider this deposition technique to be applicable for the fabrication of a new solid oxide fuel cell structure with intermediate-temperature operation. © 2009 The Japan Society of Applied Physics. |
| spellingShingle | Uchiyama, K Sakairi, H Shiosaki, T Kariya, T Ikeda, H Yanagimoto, K Yamada, Y Nakayama, A Deposition of SrZrO3 thin films using liquid delivery metal-organic chemical vapor deposition |
| title | Deposition of SrZrO3 thin films using liquid delivery metal-organic chemical vapor deposition |
| title_full | Deposition of SrZrO3 thin films using liquid delivery metal-organic chemical vapor deposition |
| title_fullStr | Deposition of SrZrO3 thin films using liquid delivery metal-organic chemical vapor deposition |
| title_full_unstemmed | Deposition of SrZrO3 thin films using liquid delivery metal-organic chemical vapor deposition |
| title_short | Deposition of SrZrO3 thin films using liquid delivery metal-organic chemical vapor deposition |
| title_sort | deposition of srzro3 thin films using liquid delivery metal organic chemical vapor deposition |
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