Influence of surface properties on the quantum photoyield of diamond photocathodes
The quantum efficiency and chemical stability of CVD diamond photocathodes has been examined. As-grown or microwave plasma hydrogenated boron-doped diamond films display a quantum photoyield of approximately 0.05% at 190 nm, which degrades gradually as the material is left in ambient atmosphere, due...
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2001
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author | Foord, J Wang, J Lau, C Hiramatsu, M Vickers, J Jackman, R |
author_facet | Foord, J Wang, J Lau, C Hiramatsu, M Vickers, J Jackman, R |
author_sort | Foord, J |
collection | OXFORD |
description | The quantum efficiency and chemical stability of CVD diamond photocathodes has been examined. As-grown or microwave plasma hydrogenated boron-doped diamond films display a quantum photoyield of approximately 0.05% at 190 nm, which degrades gradually as the material is left in ambient atmosphere, due to slow oxidation. Rapid degradation m performance occurs when exposed to atomic or electronically excited oxygen. X-ray photoelectron spectroscopy shows that the yield drops close to zero at around monolayer oxygen coverage, and that the main oxygen species on the surface is hydroxyl or isolated ether linkages. |
first_indexed | 2024-03-06T19:02:16Z |
format | Conference item |
id | oxford-uuid:13ee4e07-488d-4beb-9299-67ce6f6cb8e9 |
institution | University of Oxford |
last_indexed | 2024-03-06T19:02:16Z |
publishDate | 2001 |
record_format | dspace |
spelling | oxford-uuid:13ee4e07-488d-4beb-9299-67ce6f6cb8e92022-03-26T10:16:44ZInfluence of surface properties on the quantum photoyield of diamond photocathodesConference itemhttp://purl.org/coar/resource_type/c_5794uuid:13ee4e07-488d-4beb-9299-67ce6f6cb8e9Symplectic Elements at Oxford2001Foord, JWang, JLau, CHiramatsu, MVickers, JJackman, RThe quantum efficiency and chemical stability of CVD diamond photocathodes has been examined. As-grown or microwave plasma hydrogenated boron-doped diamond films display a quantum photoyield of approximately 0.05% at 190 nm, which degrades gradually as the material is left in ambient atmosphere, due to slow oxidation. Rapid degradation m performance occurs when exposed to atomic or electronically excited oxygen. X-ray photoelectron spectroscopy shows that the yield drops close to zero at around monolayer oxygen coverage, and that the main oxygen species on the surface is hydroxyl or isolated ether linkages. |
spellingShingle | Foord, J Wang, J Lau, C Hiramatsu, M Vickers, J Jackman, R Influence of surface properties on the quantum photoyield of diamond photocathodes |
title | Influence of surface properties on the quantum photoyield of diamond photocathodes |
title_full | Influence of surface properties on the quantum photoyield of diamond photocathodes |
title_fullStr | Influence of surface properties on the quantum photoyield of diamond photocathodes |
title_full_unstemmed | Influence of surface properties on the quantum photoyield of diamond photocathodes |
title_short | Influence of surface properties on the quantum photoyield of diamond photocathodes |
title_sort | influence of surface properties on the quantum photoyield of diamond photocathodes |
work_keys_str_mv | AT foordj influenceofsurfacepropertiesonthequantumphotoyieldofdiamondphotocathodes AT wangj influenceofsurfacepropertiesonthequantumphotoyieldofdiamondphotocathodes AT lauc influenceofsurfacepropertiesonthequantumphotoyieldofdiamondphotocathodes AT hiramatsum influenceofsurfacepropertiesonthequantumphotoyieldofdiamondphotocathodes AT vickersj influenceofsurfacepropertiesonthequantumphotoyieldofdiamondphotocathodes AT jackmanr influenceofsurfacepropertiesonthequantumphotoyieldofdiamondphotocathodes |