QUANTITATIVE EBIC INVESTIGATIONS OF DEFORMATION-INDUCED AND COPPER DECORATED DISLOCATIONS IN SILICON
Deformation induced dislocations in silicon have been found to exhibit different degrees of electrical activity dependent upon whether they were deformed at 420°C or 650°C. Furthermore the effects of copper decoration are also found to vary between dislocations produced at these temperatures. Quanti...
Main Authors: | Fell, T, Wilshaw, P |
---|---|
Format: | Journal article |
Language: | English |
Published: |
Publ by Inst of Physics Publ Ltd
1991
|
Similar Items
-
QUANTITATIVE EBIC INVESTIGATIONS OF DEFORMATION-INDUCED AND COPPER DECORATED DISLOCATIONS IN SILICON
by: Fell, T, et al.
Published: (1991) -
EBIC INVESTIGATIONS OF DISLOCATIONS AND THEIR INTERACTIONS WITH IMPURITIES IN SILICON
by: Fell, T, et al.
Published: (1993) -
AN EBIC INVESTIGATION OF ALPHA, BETA AND SCREW DISLOCATIONS IN GALLIUM-ARSENIDE
by: Galloway, S, et al.
Published: (1993) -
An SEM EBIC study of the electronic properties of dislocations in silicon
by: Wilshaw, P, et al.
Published: (1984) -
THE TEMPERATURE-DEPENDENCE OF EBIC CONTRAST FROM INDIVIDUAL DISLOCATIONS IN SILICON
by: Ourmazd, A, et al.
Published: (1983)