Nanodiamond thin films on titanium substrates - Growth and electrochemical properties
A new type of electrically conducting nanosized diamond film deposit is grown on titanium substrates in a microwave plasma chemical vapor deposition process. The deposition process occurs at 80 Torr in a helium atmosphere with only hydrogen (1.95%) and methane (0.73%) admitted and yields a deposit g...
| Main Authors: | , , , , |
|---|---|
| Format: | Journal article |
| Language: | English |
| Published: |
2003
|
| _version_ | 1797057683275120640 |
|---|---|
| author | Hian, L Grehan, K Compton, R Foord, J Marken, F |
| author_facet | Hian, L Grehan, K Compton, R Foord, J Marken, F |
| author_sort | Hian, L |
| collection | OXFORD |
| description | A new type of electrically conducting nanosized diamond film deposit is grown on titanium substrates in a microwave plasma chemical vapor deposition process. The deposition process occurs at 80 Torr in a helium atmosphere with only hydrogen (1.95%) and methane (0.73%) admitted and yields a deposit growing approximately 0.5 μm h-1 thick. Electron microscopy indicates the formation of nanosized diamond platelets. The electrochemical properties of nanodiamond when immersed in aqueous electrolyte solution are explored for the Fe(CN)63-/4- system, the Ce4+/3+ system, the oxidation of hydroquinone, ascorbic acid, and the oxidation of dihydronicotinamide adenine dinucleotide. Compared to boron-doped diamond materials, nanodiamond is a highly active electrode material with very low overpotentials for all redox systems studied. For ascorbic acid, diffusion-controlled oxidation is detected at potentials approximately 0.5 V more negative compared to those observed at boron-doped diamond electrodes. The electrical conductivity, high surface reactivity, and electrochemical characteristics are explained in terms of many defects and active surface sites. |
| first_indexed | 2024-03-06T19:39:53Z |
| format | Journal article |
| id | oxford-uuid:204b91dd-550c-46c1-813b-4444b8a7c2a2 |
| institution | University of Oxford |
| language | English |
| last_indexed | 2024-03-06T19:39:53Z |
| publishDate | 2003 |
| record_format | dspace |
| spelling | oxford-uuid:204b91dd-550c-46c1-813b-4444b8a7c2a22022-03-26T11:26:49ZNanodiamond thin films on titanium substrates - Growth and electrochemical propertiesJournal articlehttp://purl.org/coar/resource_type/c_dcae04bcuuid:204b91dd-550c-46c1-813b-4444b8a7c2a2EnglishSymplectic Elements at Oxford2003Hian, LGrehan, KCompton, RFoord, JMarken, FA new type of electrically conducting nanosized diamond film deposit is grown on titanium substrates in a microwave plasma chemical vapor deposition process. The deposition process occurs at 80 Torr in a helium atmosphere with only hydrogen (1.95%) and methane (0.73%) admitted and yields a deposit growing approximately 0.5 μm h-1 thick. Electron microscopy indicates the formation of nanosized diamond platelets. The electrochemical properties of nanodiamond when immersed in aqueous electrolyte solution are explored for the Fe(CN)63-/4- system, the Ce4+/3+ system, the oxidation of hydroquinone, ascorbic acid, and the oxidation of dihydronicotinamide adenine dinucleotide. Compared to boron-doped diamond materials, nanodiamond is a highly active electrode material with very low overpotentials for all redox systems studied. For ascorbic acid, diffusion-controlled oxidation is detected at potentials approximately 0.5 V more negative compared to those observed at boron-doped diamond electrodes. The electrical conductivity, high surface reactivity, and electrochemical characteristics are explained in terms of many defects and active surface sites. |
| spellingShingle | Hian, L Grehan, K Compton, R Foord, J Marken, F Nanodiamond thin films on titanium substrates - Growth and electrochemical properties |
| title | Nanodiamond thin films on titanium substrates - Growth and electrochemical properties |
| title_full | Nanodiamond thin films on titanium substrates - Growth and electrochemical properties |
| title_fullStr | Nanodiamond thin films on titanium substrates - Growth and electrochemical properties |
| title_full_unstemmed | Nanodiamond thin films on titanium substrates - Growth and electrochemical properties |
| title_short | Nanodiamond thin films on titanium substrates - Growth and electrochemical properties |
| title_sort | nanodiamond thin films on titanium substrates growth and electrochemical properties |
| work_keys_str_mv | AT hianl nanodiamondthinfilmsontitaniumsubstratesgrowthandelectrochemicalproperties AT grehank nanodiamondthinfilmsontitaniumsubstratesgrowthandelectrochemicalproperties AT comptonr nanodiamondthinfilmsontitaniumsubstratesgrowthandelectrochemicalproperties AT foordj nanodiamondthinfilmsontitaniumsubstratesgrowthandelectrochemicalproperties AT markenf nanodiamondthinfilmsontitaniumsubstratesgrowthandelectrochemicalproperties |