Photonic crystals for the visible spectrum by holographic lithography
The fabrication of three-dimensional photonic crystal structures with sub-micron periodicity was performed by holographic lithography. The photonic crystals of titanium dioxide and polymeric materials were characterized by scanning electron microscopy and optical diffraction measurements. The interf...
| Main Authors: | , , , |
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| Format: | Journal article |
| Language: | English |
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IEEE
2000
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| _version_ | 1826262943414616064 |
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| author | Sharp, D Turberfield, A Campbell, M Denning, R |
| author_facet | Sharp, D Turberfield, A Campbell, M Denning, R |
| author_sort | Sharp, D |
| collection | OXFORD |
| description | The fabrication of three-dimensional photonic crystal structures with sub-micron periodicity was performed by holographic lithography. The photonic crystals of titanium dioxide and polymeric materials were characterized by scanning electron microscopy and optical diffraction measurements. The interference pattern generated at the intersection of four beams from a neodymium laser was employed for the exposure of the photoresist. |
| first_indexed | 2024-03-06T19:43:49Z |
| format | Journal article |
| id | oxford-uuid:21919859-70dc-42b9-90e3-2076764bf5f9 |
| institution | University of Oxford |
| language | English |
| last_indexed | 2024-03-06T19:43:49Z |
| publishDate | 2000 |
| publisher | IEEE |
| record_format | dspace |
| spelling | oxford-uuid:21919859-70dc-42b9-90e3-2076764bf5f92022-03-26T11:34:12ZPhotonic crystals for the visible spectrum by holographic lithographyJournal articlehttp://purl.org/coar/resource_type/c_dcae04bcuuid:21919859-70dc-42b9-90e3-2076764bf5f9EnglishSymplectic Elements at OxfordIEEE2000Sharp, DTurberfield, ACampbell, MDenning, RThe fabrication of three-dimensional photonic crystal structures with sub-micron periodicity was performed by holographic lithography. The photonic crystals of titanium dioxide and polymeric materials were characterized by scanning electron microscopy and optical diffraction measurements. The interference pattern generated at the intersection of four beams from a neodymium laser was employed for the exposure of the photoresist. |
| spellingShingle | Sharp, D Turberfield, A Campbell, M Denning, R Photonic crystals for the visible spectrum by holographic lithography |
| title | Photonic crystals for the visible spectrum by holographic lithography |
| title_full | Photonic crystals for the visible spectrum by holographic lithography |
| title_fullStr | Photonic crystals for the visible spectrum by holographic lithography |
| title_full_unstemmed | Photonic crystals for the visible spectrum by holographic lithography |
| title_short | Photonic crystals for the visible spectrum by holographic lithography |
| title_sort | photonic crystals for the visible spectrum by holographic lithography |
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