Resonant interferometric lithography beyond the diffraction limit
A novel approach for the generation of subwavelength structures in interferometric optical lithography is described. Our scheme relies on the preparation of the system in a position dependent trapping state via phase shifted standing wave patterns. Since this process only comprises resonant atom-fie...
| Main Authors: | , , |
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| Format: | Journal article |
| Language: | English |
| Published: |
2008
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