$Resonant interferometric lithography beyond the diffraction limit$

Resonant interferometric lithography beyond the diffraction limit

A novel approach for the generation of subwavelength structures in interferometric optical lithography is described. Our scheme relies on the preparation of the system in a position dependent trapping state via phase shifted standing wave patterns. Since this process only comprises resonant atom-fie...

Ausführliche Beschreibung

Bibliographische Detailangaben
Hauptverfasser:	Kiffner, M, Evers, J, Zubairy, MS
Format:	Journal article
Sprache:	English
Veröffentlicht:	2008

$Resonant interferometric lithography beyond the diffraction limit$

Resonant interferometric lithography beyond the diffraction limit von Kiffner, M, Evers, J, Zubairy, MS

Veröffentlicht 2009

Journal article

$Resonant interferometric lithography beyond the diffraction limit$

Resonant interferometric lithography beyond the diffraction limit von Kiffner, M, Evers, J, Zubairy, MS

Veröffentlicht 2009

Journal article

$Resonant interferometric lithography beyond the diffraction limit.$

Resonant interferometric lithography beyond the diffraction limit. von Kiffner, M, Evers, J, Zubairy, MS

Veröffentlicht 2008

Journal article

$Resonant interferometric lithography beyond the diffraction limit$

Resonant interferometric lithography beyond the diffraction limit von Evers, J, Kiffner, M, Suhail Zubairy, M

Veröffentlicht 2008

Journal article

Resonant interferometric lithography beyond the diffraction limit

Resonant interferometric lithography beyond the diffraction limit von Kiffner, M, Evers, J, Zubairy, MS

Resonant interferometric lithography beyond the diffraction limit von Kiffner, M, Evers, J, Zubairy, MS

Resonant interferometric lithography beyond the diffraction limit. von Kiffner, M, Evers, J, Zubairy, MS

Resonant interferometric lithography beyond the diffraction limit von Evers, J, Kiffner, M, Suhail Zubairy, M

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