Controlling in‐plane magnetic anisotropy of Co films on MgO substrates using glancing angle deposition

The ability to control the in-plane magnetic anisotropy of a thin film is important for magnetic device applications. One way of accomplishing this task is by glancing angle deposition (GLAD). In this study, thin Co layers have been deposited using GLAD magnetron sputtering on MgO(001) and MgO(110)...

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Main Authors: Frisk, A, Achinuq, B, Newman, DG, Heppell, E, Dąbrowski, M, Hicken, RJ, van der Laan, G, Hesjedal, T
Format: Journal article
Language:English
Published: Wiley 2023
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author Frisk, A
Achinuq, B
Newman, DG
Heppell, E
Dąbrowski, M
Hicken, RJ
van der Laan, G
Hesjedal, T
author_facet Frisk, A
Achinuq, B
Newman, DG
Heppell, E
Dąbrowski, M
Hicken, RJ
van der Laan, G
Hesjedal, T
author_sort Frisk, A
collection OXFORD
description The ability to control the in-plane magnetic anisotropy of a thin film is important for magnetic device applications. One way of accomplishing this task is by glancing angle deposition (GLAD). In this study, thin Co layers have been deposited using GLAD magnetron sputtering on MgO(001) and MgO(110) substrates. For Co films on MgO(001), the in-plane anisotropy direction can be directly controlled via the deposition angle. In contrast, for Co on MgO(110), the anisotropy due to the deposition angle is competing with the anisotropy induced by the substrate, while the growth parameters determine which contribution dominates. On the other hand, while on MgO(001) the deposition angle as well as the film thickness affect the strength of the Co in-plane anisotropy, no influence of these parameters on the magnetic properties is found for films on MgO(110).
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spelling oxford-uuid:2e922692-8895-4550-8d58-5e9def364dfa2023-09-06T09:33:34ZControlling in‐plane magnetic anisotropy of Co films on MgO substrates using glancing angle depositionJournal articlehttp://purl.org/coar/resource_type/c_dcae04bcuuid:2e922692-8895-4550-8d58-5e9def364dfaEnglishSymplectic ElementsWiley2023Frisk, AAchinuq, BNewman, DGHeppell, EDąbrowski, MHicken, RJvan der Laan, GHesjedal, TThe ability to control the in-plane magnetic anisotropy of a thin film is important for magnetic device applications. One way of accomplishing this task is by glancing angle deposition (GLAD). In this study, thin Co layers have been deposited using GLAD magnetron sputtering on MgO(001) and MgO(110) substrates. For Co films on MgO(001), the in-plane anisotropy direction can be directly controlled via the deposition angle. In contrast, for Co on MgO(110), the anisotropy due to the deposition angle is competing with the anisotropy induced by the substrate, while the growth parameters determine which contribution dominates. On the other hand, while on MgO(001) the deposition angle as well as the film thickness affect the strength of the Co in-plane anisotropy, no influence of these parameters on the magnetic properties is found for films on MgO(110).
spellingShingle Frisk, A
Achinuq, B
Newman, DG
Heppell, E
Dąbrowski, M
Hicken, RJ
van der Laan, G
Hesjedal, T
Controlling in‐plane magnetic anisotropy of Co films on MgO substrates using glancing angle deposition
title Controlling in‐plane magnetic anisotropy of Co films on MgO substrates using glancing angle deposition
title_full Controlling in‐plane magnetic anisotropy of Co films on MgO substrates using glancing angle deposition
title_fullStr Controlling in‐plane magnetic anisotropy of Co films on MgO substrates using glancing angle deposition
title_full_unstemmed Controlling in‐plane magnetic anisotropy of Co films on MgO substrates using glancing angle deposition
title_short Controlling in‐plane magnetic anisotropy of Co films on MgO substrates using glancing angle deposition
title_sort controlling in plane magnetic anisotropy of co films on mgo substrates using glancing angle deposition
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