APA(7版)引用形式

Beckman, J., Jackman, R., & Foord, J. (1994). CAPACITIVELY COUPLED RF PLASMA SOURCES - A VIABLE APPROACH FOR CVD DIAMOND GROWTH.

Chicagoスタイル(17版)引用形式

Beckman, J., R. Jackman, , J. Foord. CAPACITIVELY COUPLED RF PLASMA SOURCES - A VIABLE APPROACH FOR CVD DIAMOND GROWTH. 1994.

MLA(9版)引用形式

Beckman, J., et al. CAPACITIVELY COUPLED RF PLASMA SOURCES - A VIABLE APPROACH FOR CVD DIAMOND GROWTH. 1994.

警告: この引用は必ずしも正確ではありません.