Cita APA (7th ed.)

Beckman, J., Jackman, R., & Foord, J. (1994). CAPACITIVELY COUPLED RF PLASMA SOURCES - A VIABLE APPROACH FOR CVD DIAMOND GROWTH.

Cita Chicago (17th ed.)

Beckman, J., R. Jackman, i J. Foord. CAPACITIVELY COUPLED RF PLASMA SOURCES - A VIABLE APPROACH FOR CVD DIAMOND GROWTH. 1994.

Cita MLA (9th ed.)

Beckman, J., et al. CAPACITIVELY COUPLED RF PLASMA SOURCES - A VIABLE APPROACH FOR CVD DIAMOND GROWTH. 1994.