Dyfyniad APA

Beckman, J., Jackman, R., & Foord, J. (1994). CAPACITIVELY COUPLED RF PLASMA SOURCES - A VIABLE APPROACH FOR CVD DIAMOND GROWTH.

Dyfyniad Arddull Chicago

Beckman, J., R. Jackman, and J. Foord. CAPACITIVELY COUPLED RF PLASMA SOURCES - A VIABLE APPROACH FOR CVD DIAMOND GROWTH. 1994.

Dyfyniad MLA

Beckman, J., et al. CAPACITIVELY COUPLED RF PLASMA SOURCES - A VIABLE APPROACH FOR CVD DIAMOND GROWTH. 1994.

Rhybudd: Mae'n bosib nad yw'r dyfyniadau hyn bob amser yn 100% cywir.