Beckman, J., Jackman, R., & Foord, J. (1994). CAPACITIVELY COUPLED RF PLASMA SOURCES - A VIABLE APPROACH FOR CVD DIAMOND GROWTH.
Lua i Stíl Chicago (17ú heag.)Beckman, J., R. Jackman, agus J. Foord. CAPACITIVELY COUPLED RF PLASMA SOURCES - A VIABLE APPROACH FOR CVD DIAMOND GROWTH. 1994.
Lua MLA (9ú heag.)Beckman, J., et al. CAPACITIVELY COUPLED RF PLASMA SOURCES - A VIABLE APPROACH FOR CVD DIAMOND GROWTH. 1994.
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