APA引文

Beckman, J., Jackman, R., & Foord, J. (1994). CAPACITIVELY COUPLED RF PLASMA SOURCES - A VIABLE APPROACH FOR CVD DIAMOND GROWTH.

芝加哥风格引文

Beckman, J., R. Jackman, 与 J. Foord. CAPACITIVELY COUPLED RF PLASMA SOURCES - A VIABLE APPROACH FOR CVD DIAMOND GROWTH. 1994.

MLA引文

Beckman, J., et al. CAPACITIVELY COUPLED RF PLASMA SOURCES - A VIABLE APPROACH FOR CVD DIAMOND GROWTH. 1994.