CAPACITIVELY COUPLED RF PLASMA SOURCES - A VIABLE APPROACH FOR CVD DIAMOND GROWTH
The means by which microwave and r.f. excitation can stimulate gaseous plasma formation are considered in terms of the requirements for a diamond chemical vapour deposition (CVD) process. It is apparent that capacitively coupled r.f. plasma sources offer distinct practical advantages over microwaves...
| Үндсэн зохиолчид: | , , |
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| Формат: | Conference item |
| Хэвлэсэн: |
1994
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