DIAMOND CHEMICAL-VAPOR-DEPOSITION FROM A CAPACITIVELY COUPLED RADIO-FREQUENCY PLASMA
Capacitively coupled radio frequency (cc-rf) plasmas offer advantages over microwave (MW) induced plasmas for the growth of large area homogeneous thin films. However, conventionally designed cc-rf sources lead, at best, to extremely poor quality material when diamond growth is attempted. The first...
| Main Authors: | , , |
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| Format: | Journal article |
| Language: | English |
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1995
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| _version_ | 1797061226438590464 |
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| author | Jackman, R Beckman, J Foord, J |
| author_facet | Jackman, R Beckman, J Foord, J |
| author_sort | Jackman, R |
| collection | OXFORD |
| description | Capacitively coupled radio frequency (cc-rf) plasmas offer advantages over microwave (MW) induced plasmas for the growth of large area homogeneous thin films. However, conventionally designed cc-rf sources lead, at best, to extremely poor quality material when diamond growth is attempted. The first complete diamond overlayer to be grown with cc-rf is reported here, where a novel magnetically enhanced source with ring electrodes has been used.© 1995 American Institute of Physics. |
| first_indexed | 2024-03-06T20:28:03Z |
| format | Journal article |
| id | oxford-uuid:300fce00-7429-4b0c-9576-6a21c9145793 |
| institution | University of Oxford |
| language | English |
| last_indexed | 2024-03-06T20:28:03Z |
| publishDate | 1995 |
| record_format | dspace |
| spelling | oxford-uuid:300fce00-7429-4b0c-9576-6a21c91457932022-03-26T12:59:18ZDIAMOND CHEMICAL-VAPOR-DEPOSITION FROM A CAPACITIVELY COUPLED RADIO-FREQUENCY PLASMAJournal articlehttp://purl.org/coar/resource_type/c_dcae04bcuuid:300fce00-7429-4b0c-9576-6a21c9145793EnglishSymplectic Elements at Oxford1995Jackman, RBeckman, JFoord, JCapacitively coupled radio frequency (cc-rf) plasmas offer advantages over microwave (MW) induced plasmas for the growth of large area homogeneous thin films. However, conventionally designed cc-rf sources lead, at best, to extremely poor quality material when diamond growth is attempted. The first complete diamond overlayer to be grown with cc-rf is reported here, where a novel magnetically enhanced source with ring electrodes has been used.© 1995 American Institute of Physics. |
| spellingShingle | Jackman, R Beckman, J Foord, J DIAMOND CHEMICAL-VAPOR-DEPOSITION FROM A CAPACITIVELY COUPLED RADIO-FREQUENCY PLASMA |
| title | DIAMOND CHEMICAL-VAPOR-DEPOSITION FROM A CAPACITIVELY COUPLED RADIO-FREQUENCY PLASMA |
| title_full | DIAMOND CHEMICAL-VAPOR-DEPOSITION FROM A CAPACITIVELY COUPLED RADIO-FREQUENCY PLASMA |
| title_fullStr | DIAMOND CHEMICAL-VAPOR-DEPOSITION FROM A CAPACITIVELY COUPLED RADIO-FREQUENCY PLASMA |
| title_full_unstemmed | DIAMOND CHEMICAL-VAPOR-DEPOSITION FROM A CAPACITIVELY COUPLED RADIO-FREQUENCY PLASMA |
| title_short | DIAMOND CHEMICAL-VAPOR-DEPOSITION FROM A CAPACITIVELY COUPLED RADIO-FREQUENCY PLASMA |
| title_sort | diamond chemical vapor deposition from a capacitively coupled radio frequency plasma |
| work_keys_str_mv | AT jackmanr diamondchemicalvapordepositionfromacapacitivelycoupledradiofrequencyplasma AT beckmanj diamondchemicalvapordepositionfromacapacitivelycoupledradiofrequencyplasma AT foordj diamondchemicalvapordepositionfromacapacitivelycoupledradiofrequencyplasma |