DIAMOND CHEMICAL-VAPOR-DEPOSITION FROM A CAPACITIVELY COUPLED RADIO-FREQUENCY PLASMA

Capacitively coupled radio frequency (cc-rf) plasmas offer advantages over microwave (MW) induced plasmas for the growth of large area homogeneous thin films. However, conventionally designed cc-rf sources lead, at best, to extremely poor quality material when diamond growth is attempted. The first...

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Bibliographic Details
Main Authors: Jackman, R, Beckman, J, Foord, J
Format: Journal article
Language:English
Published: 1995