All-optical GeV electron bunch generation in a laser-plasma accelerator via truncated-channel injection.

We describe a simple scheme, truncated-channel injection, to inject electrons directly into the wakefield driven by a high-intensity laser pulse guided in an all-optical plasma channel. We use this approach to generate dark-current-free 1.2 GeV, 4.5% relative energy spread electron bunches with 120 ...

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Detalhes bibliográficos
Principais autores: Picksley, A, Chappell, J, Archer, E, Bourgeois, N, Cowley, J, Emerson, DR, Feder, L, Gu, XJ, Jakobsson, O, Ross, AJ, Wang, W, Walczak, R, Hooker, SM
Formato: Journal article
Idioma:English
Publicado em: American Physical Society 2023