Zhang, J., Key, M., Norreys, P., & Tallents, G. (1993). Intensity ratio of resonance lines as a diagnostic of initial conditions suitable for XUV laser action in recombining plasmas.
Lua i Stíl Chicago (17ú heag.)Zhang, J., M. Key, P. Norreys, agus G. Tallents. Intensity Ratio of Resonance Lines as a Diagnostic of Initial Conditions Suitable for XUV Laser Action in Recombining Plasmas. 1993.
Lua MLA (9ú heag.)Zhang, J., et al. Intensity Ratio of Resonance Lines as a Diagnostic of Initial Conditions Suitable for XUV Laser Action in Recombining Plasmas. 1993.
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