Zhang, J., Key, M., Norreys, P., & Tallents, G. (1993). Intensity ratio of resonance lines as a diagnostic of initial conditions suitable for XUV laser action in recombining plasmas.
Citação norma ChicagoZhang, J., M. Key, P. Norreys, and G. Tallents. Intensity Ratio of Resonance Lines as a Diagnostic of Initial Conditions Suitable for XUV Laser Action in Recombining Plasmas. 1993.
Citação norma MLAZhang, J., et al. Intensity Ratio of Resonance Lines as a Diagnostic of Initial Conditions Suitable for XUV Laser Action in Recombining Plasmas. 1993.
Nota: a formatação da citação pode não corresponder 100% ao definido pela respectiva norma.