Zhang, J., Key, M., Norreys, P., & Tallents, G. (1993). Intensity ratio of resonance lines as a diagnostic of initial conditions suitable for XUV laser action in recombining plasmas.
Chicago Style (17th ed.) CitationZhang, J., M. Key, P. Norreys, and G. Tallents. Intensity Ratio of Resonance Lines as a Diagnostic of Initial Conditions Suitable for XUV Laser Action in Recombining Plasmas. 1993.
MLA citiranjeZhang, J., et al. Intensity Ratio of Resonance Lines as a Diagnostic of Initial Conditions Suitable for XUV Laser Action in Recombining Plasmas. 1993.
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