Zhang, J., Key, M., Norreys, P., & Tallents, G. (1993). Intensity ratio of resonance lines as a diagnostic of initial conditions suitable for XUV laser action in recombining plasmas.
Chicago Style (17. basım) AtıfZhang, J., M. Key, P. Norreys, ve G. Tallents. Intensity Ratio of Resonance Lines as a Diagnostic of Initial Conditions Suitable for XUV Laser Action in Recombining Plasmas. 1993.
MLA (9th ed.) AtıfZhang, J., et al. Intensity Ratio of Resonance Lines as a Diagnostic of Initial Conditions Suitable for XUV Laser Action in Recombining Plasmas. 1993.
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