APA引文

Zhang, J., Key, M., Norreys, P., & Tallents, G. (1993). Intensity ratio of resonance lines as a diagnostic of initial conditions suitable for XUV laser action in recombining plasmas.

Chicago Style (17th ed.) Citation

Zhang, J., M. Key, P. Norreys, and G. Tallents. Intensity Ratio of Resonance Lines as a Diagnostic of Initial Conditions Suitable for XUV Laser Action in Recombining Plasmas. 1993.

MLA引文

Zhang, J., et al. Intensity Ratio of Resonance Lines as a Diagnostic of Initial Conditions Suitable for XUV Laser Action in Recombining Plasmas. 1993.