Loong, W., Chen, T., Shy, S., Tseng, J., & Lin, R. (1996). TiSix as a new embedded material for attenuated phase shift mask.
Chicago-čujuhus (17. p.)Loong, W., T. Chen, S. Shy, J. Tseng, juo R. Lin. TiSix as a New Embedded Material for Attenuated Phase Shift Mask. 1996.
MLA-čujuhus (9. p.)Loong, W., et al. TiSix as a New Embedded Material for Attenuated Phase Shift Mask. 1996.
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