समान संसाधन
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Additional Siconi™ pre-clean for reliable TiSix contacts in advanced imager technologies
द्वारा: M. Grégoire, और अन्य
प्रकाशित: (2019-03-01) -
The new method of fabrication of submicron structures by optical lithography with mask shifting and mask rotation
द्वारा: Indykiewicz Kornelia, और अन्य
प्रकाशित: (2013-02-01) -
Application of phase shift masking to sub-0.13 micron lithography
द्वारा: Koo, Chee Kiong.
प्रकाशित: (2008) -
Application of phase shift masking to sub-micron contact level lithography
द्वारा: Choo, Lay Cheng.
प्रकाशित: (2008) -
Proximal Algorithms for Discrete-Level Phase-Shifting Mask Design with Application to Optogenetics
द्वारा: Dimitris Ampeliotis, और अन्य
प्रकाशित: (2021-10-01)