Ижил төстэй зүйлс
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Additional Siconi™ pre-clean for reliable TiSix contacts in advanced imager technologies
-н: M. Grégoire, зэрэг
Хэвлэсэн: (2019-03-01) -
The new method of fabrication of submicron structures by optical lithography with mask shifting and mask rotation
-н: Indykiewicz Kornelia, зэрэг
Хэвлэсэн: (2013-02-01) -
Application of phase shift masking to sub-0.13 micron lithography
-н: Koo, Chee Kiong.
Хэвлэсэн: (2008) -
Application of phase shift masking to sub-micron contact level lithography
-н: Choo, Lay Cheng.
Хэвлэсэн: (2008) -
Proximal Algorithms for Discrete-Level Phase-Shifting Mask Design with Application to Optogenetics
-н: Dimitris Ampeliotis, зэрэг
Хэвлэсэн: (2021-10-01)