Saltar ao contenido
VuFind
English
Deutsch
Español
Français
Italiano
日本語
Nederlands
Português
Português (Brasil)
中文(简体)
中文（繁體）
Türkçe
עברית
Gaeilge
Cymraeg
Ελληνικά
Català
Euskara
Русский
Čeština
Suomi
Svenska
polski
Dansk
slovenščina
اللغة العربية
বাংলা
Galego
Tiếng Việt
Hrvatski
हिंदी
Հայերէն
Українська
Sámegiella
Монгол
Idioma
Todos os campos
Title
Autor
Subject
Número de Clasificación
ISBN/ISSN
Tag
Buscar
Avanzado
TiSix as a new embedded materi...
Citar
Text this
Enviar este rexistro por email
Imprimir
Exportar rexistro
Exportar a RefWorks
Exportar a EndNoteWeb
Exportar a EndNote
Permanent link
TiSix as a new embedded material for attenuated phase shift mask
Detalles Bibliográficos
Main Authors:
Loong, W
,
Chen, T
,
Shy, S
,
Tseng, J
,
Lin, R
Formato:
Conference item
Publicado:
1996
Existencias
Descripción
Títulos similares
Staff View
Títulos similares
Application of phase shift masking to sub-0.13 micron lithography
por: Koo, Chee Kiong.
Publicado: (2008)
Application of phase shift masking to sub-micron contact level lithography
por: Choo, Lay Cheng.
Publicado: (2008)
Proximal Algorithms for Discrete-Level Phase-Shifting Mask Design with Application to Optogenetics
por: Dimitris Ampeliotis, et al.
Publicado: (2021-10-01)
Phase shift, amplification, oscillation and attenuation of solitons in nonlinear optics
por: Weitian Yu, et al.
Publicado: (2019-01-01)
Acoustic Attenuation of COVID-19 Face Masks: Correlation to Fibrous Material Porosity, Mask Breathability and Bacterial Filtration Efficiency
por: Milena Martarelli, et al.
Publicado: (2022-02-01)