TiSix as a new embedded material for attenuated phase shift mask

समान संसाधन

• Additional Siconi™ pre-clean for reliable TiSix contacts in advanced imager technologies
  द्वारा: M. Grégoire, और अन्य
  प्रकाशित: (2019-03-01)
• The new method of fabrication of submicron structures by optical lithography with mask shifting and mask rotation
  द्वारा: Indykiewicz Kornelia, और अन्य
  प्रकाशित: (2013-02-01)
• Application of phase shift masking to sub-0.13 micron lithography
  द्वारा: Koo, Chee Kiong.
  प्रकाशित: (2008)
• Application of phase shift masking to sub-micron contact level lithography
  द्वारा: Choo, Lay Cheng.
  प्रकाशित: (2008)
• Proximal Algorithms for Discrete-Level Phase-Shifting Mask Design with Application to Optogenetics
  द्वारा: Dimitris Ampeliotis, और अन्य
  प्रकाशित: (2021-10-01)