Atomic resolution imaging and topography of boron nitride sheets produced by chemical exfoliation

Here, we present a simple method for preparing thin few-layer sheets of hexagonal BN with micrometer-sized dimensions using chemical exfoliation in the solvent 1,2-dichloroethane. The atomic structure of both few-layer and monolayer BN sheets is directly imaged using aberration-corrected high-resolu...

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Asıl Yazarlar: Warner, J, Rümmeli, M, Bachmatiuk, A, Büchner, B
Materyal Türü: Journal article
Dil:English
Baskı/Yayın Bilgisi: 2010
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author Warner, J
Rümmeli, M
Bachmatiuk, A
Büchner, B
author_facet Warner, J
Rümmeli, M
Bachmatiuk, A
Büchner, B
author_sort Warner, J
collection OXFORD
description Here, we present a simple method for preparing thin few-layer sheets of hexagonal BN with micrometer-sized dimensions using chemical exfoliation in the solvent 1,2-dichloroethane. The atomic structure of both few-layer and monolayer BN sheets is directly imaged using aberration-corrected high-resolution transmission electron microscopy. Electron beam induced sputtering effects are examined in real time. The removal of layers of BN by electron beam irradiation leads to the exposure of a step edge between a monolayer and bilayer region. We use HRTEM imaging combined with image simulations to show that BN bilayers can have AB stacking and are not limited to just AA stacking. © 2010 American Chemical Society.
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spelling oxford-uuid:3ea897da-c446-4726-a178-b2849f4a97b02022-03-26T14:26:51ZAtomic resolution imaging and topography of boron nitride sheets produced by chemical exfoliationJournal articlehttp://purl.org/coar/resource_type/c_dcae04bcuuid:3ea897da-c446-4726-a178-b2849f4a97b0EnglishSymplectic Elements at Oxford2010Warner, JRümmeli, MBachmatiuk, ABüchner, BHere, we present a simple method for preparing thin few-layer sheets of hexagonal BN with micrometer-sized dimensions using chemical exfoliation in the solvent 1,2-dichloroethane. The atomic structure of both few-layer and monolayer BN sheets is directly imaged using aberration-corrected high-resolution transmission electron microscopy. Electron beam induced sputtering effects are examined in real time. The removal of layers of BN by electron beam irradiation leads to the exposure of a step edge between a monolayer and bilayer region. We use HRTEM imaging combined with image simulations to show that BN bilayers can have AB stacking and are not limited to just AA stacking. © 2010 American Chemical Society.
spellingShingle Warner, J
Rümmeli, M
Bachmatiuk, A
Büchner, B
Atomic resolution imaging and topography of boron nitride sheets produced by chemical exfoliation
title Atomic resolution imaging and topography of boron nitride sheets produced by chemical exfoliation
title_full Atomic resolution imaging and topography of boron nitride sheets produced by chemical exfoliation
title_fullStr Atomic resolution imaging and topography of boron nitride sheets produced by chemical exfoliation
title_full_unstemmed Atomic resolution imaging and topography of boron nitride sheets produced by chemical exfoliation
title_short Atomic resolution imaging and topography of boron nitride sheets produced by chemical exfoliation
title_sort atomic resolution imaging and topography of boron nitride sheets produced by chemical exfoliation
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AT rummelim atomicresolutionimagingandtopographyofboronnitridesheetsproducedbychemicalexfoliation
AT bachmatiuka atomicresolutionimagingandtopographyofboronnitridesheetsproducedbychemicalexfoliation
AT buchnerb atomicresolutionimagingandtopographyofboronnitridesheetsproducedbychemicalexfoliation