Near-field phase shift photolithography for high-frequency SAW transducers
Optical lithography has been widely used in mass production of various electronic devices, mainly because of its high throughput capability. However, the resolution in conventional lithography is diffraction limited. Cost issues, on the other hand, make slower but higher resolution methods, like ele...
Հիմնական հեղինակներ: | Hesjedal, T, Seidel, W, Kostial, H |
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Ձևաչափ: | Conference item |
Հրապարակվել է: |
2002
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Նմանատիպ նյութեր
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Near-field elastomeric mask photolithography fabrication of high-frequency surface acoustic wave transducers
: Hesjedal, T, և այլն
Հրապարակվել է: (2003) -
Parallel scanning near-field photolithography: the Snomipede
: Ul-Haq, Ehtsham, և այլն
Հրապարակվել է: (2010) -
Near-field sub-diffraction photolithography with an elastomeric photomask
: Sangyoon Paik, և այլն
Հրապարակվել է: (2020-02-01) -
The snomipede : a parallel platform for scanning near-field photolithography.
: Ul-Haq, Ehtsham, և այլն
Հրապարակվել է: (2011) -
AFM observation of surface acoustic waves emitted from single symmetric SAW transducers.
: Hesjedal, T, և այլն
Հրապարակվել է: (2001)