Near-field phase shift photolithography for high-frequency SAW transducers
Optical lithography has been widely used in mass production of various electronic devices, mainly because of its high throughput capability. However, the resolution in conventional lithography is diffraction limited. Cost issues, on the other hand, make slower but higher resolution methods, like ele...
| Auteurs principaux: | , , |
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| Format: | Conference item |
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2002
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