Formation of diamond and nanocrystalline diamond films by microwave plasma CVD
Diamond growth was carried out using various kinds of substrates and substrate holders in conventional microwave plasma-enhanced chemical vapor deposition with a mixture of CH4 and H2, and the quality and electrical properties of the diamond films were investigated. The surface morphology and proper...
Auteurs principaux: | Hiramatsu, M, Lau, C, Bennett, A, Foord, J |
---|---|
Format: | Conference item |
Publié: |
2002
|
Documents similaires
-
Measurement of C-2 radical density in microwave methane/hydrogen plasma used for nanocrystalline diamond film formation
par: Hiramatsu, M, et autres
Publié: (2003) -
Deposition of highly oriented diamond films by microwave plasma enhanced CVD
par: Liao, Xiao Ning.
Publié: (2010) -
The effect of hydrogen on the electronic properties of CVD diamond films
par: Looi, H, et autres
Publié: (1999) -
Electrochemically controlled modification of CVD diamond surfaces
par: Foord, J, et autres
Publié: (2004) -
Deposition of diamond films by microwave plasma CVD on 4H-SiC substrates
par: Shasha Wei, et autres
Publié: (2023-01-01)