Microwave activation of processes in mesopores: The thiourea electrooxidation at mesoporous platinum

In situ microwave activation is applied to the electrochemical oxidation of thiourea at low surface area (polished polycrystalline) and at high surface area (electrodeposited mesoporous platinum coated) platinum microelectrodes. The one electron oxidation of thiourea to formamidine disulfide is moni...

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Asıl Yazarlar: Ghanem, M, Coles, B, Compton, R, Marken, F
Materyal Türü: Journal article
Dil:English
Baskı/Yayın Bilgisi: 2006
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author Ghanem, M
Coles, B
Compton, R
Marken, F
author_facet Ghanem, M
Coles, B
Compton, R
Marken, F
author_sort Ghanem, M
collection OXFORD
description In situ microwave activation is applied to the electrochemical oxidation of thiourea at low surface area (polished polycrystalline) and at high surface area (electrodeposited mesoporous platinum coated) platinum microelectrodes. The one electron oxidation of thiourea to formamidine disulfide is monitored as a function of the different activation parameters. In the absence of microwaves (ambient temperature, low mass transport) increasing the surface area (roughness) increases the thiourea oxidation response predominantly due to adsorption effects. In the presence of high microwave intensities, high mass transport and thermal effects further increase the oxidation current at mesoporous platinum. The most effective thickness of the mesoporous platinum film for the thiourea oxidation process is estimated as 3 μm independent of electrode diameter, temperature, or mass transport effects. © 2006 Wiley-VCH Verlag GmbH and Co. KGaA.
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spelling oxford-uuid:54f477d5-e23a-41fa-8013-813b09f6c4812022-03-26T16:40:58ZMicrowave activation of processes in mesopores: The thiourea electrooxidation at mesoporous platinumJournal articlehttp://purl.org/coar/resource_type/c_dcae04bcuuid:54f477d5-e23a-41fa-8013-813b09f6c481EnglishSymplectic Elements at Oxford2006Ghanem, MColes, BCompton, RMarken, FIn situ microwave activation is applied to the electrochemical oxidation of thiourea at low surface area (polished polycrystalline) and at high surface area (electrodeposited mesoporous platinum coated) platinum microelectrodes. The one electron oxidation of thiourea to formamidine disulfide is monitored as a function of the different activation parameters. In the absence of microwaves (ambient temperature, low mass transport) increasing the surface area (roughness) increases the thiourea oxidation response predominantly due to adsorption effects. In the presence of high microwave intensities, high mass transport and thermal effects further increase the oxidation current at mesoporous platinum. The most effective thickness of the mesoporous platinum film for the thiourea oxidation process is estimated as 3 μm independent of electrode diameter, temperature, or mass transport effects. © 2006 Wiley-VCH Verlag GmbH and Co. KGaA.
spellingShingle Ghanem, M
Coles, B
Compton, R
Marken, F
Microwave activation of processes in mesopores: The thiourea electrooxidation at mesoporous platinum
title Microwave activation of processes in mesopores: The thiourea electrooxidation at mesoporous platinum
title_full Microwave activation of processes in mesopores: The thiourea electrooxidation at mesoporous platinum
title_fullStr Microwave activation of processes in mesopores: The thiourea electrooxidation at mesoporous platinum
title_full_unstemmed Microwave activation of processes in mesopores: The thiourea electrooxidation at mesoporous platinum
title_short Microwave activation of processes in mesopores: The thiourea electrooxidation at mesoporous platinum
title_sort microwave activation of processes in mesopores the thiourea electrooxidation at mesoporous platinum
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