The effect of mismatch strain on Stranski-Krastanow transition in epitaxial GexSi1-xSi(0 0 1) gas-source growth

Liknande verk

• Reduction of dislocation mobility in GexSi1-x epilayers
  av: Jurkschat, K, et al.
  Publicerad: (1996)
• The effect of ion-implantation induced defects on strain relaxation in GexSi1-x/Si heterostructures
  av: Glasko, J, et al.
  Publicerad: (1997)
• A mechanism for "double half dislocation loops" nucleation in low misfit epitaxial GeXSi1-X on Si
  av: Hirsch, P
  Publicerad: (1997)
• The effect of irradiation temperature on post-irradiation strain levels in GexSi1-x/Si strained layer heterostructures
  av: Glasko, J, et al.
  Publicerad: (1996)
• Ultra-steep side facets in multi-faceted SiGe/Si(001) Stranski-Krastanow islands
  av: Brehm Moritz, et al.
  Publicerad: (2011-01-01)