SEMICONDUCTOR SURFACE ETCHING BY HALOGENS - FUNDAMENTAL STEPS

Παρόμοια τεκμήρια

• Semiconductor surface etching by halogens: Fundamental steps
  ανά: Jackman, R, κ.ά.
  Έκδοση: (1989)
• REACTION-MECHANISMS FOR THE PHOTON-ENHANCED ETCHING OF SEMICONDUCTORS - AN INVESTIGATION OF THE UV-STIMULATED INTERACTION OF CHLORINE WITH SI(100)
  ανά: Jackman, R, κ.ά.
  Έκδοση: (1986)
• THERMAL AND ION-BEAM-INDUCED ETCHING OF INP WITH CHLORINE
  ανά: Murrell, A, κ.ά.
  Έκδοση: (1989)
• Thermal and ion-beam-induced etching of InP with chlorine
  ανά: Murrell, A, κ.ά.
  Έκδοση: (1989)
• HALOGEN ADSORPTION AND HALOGEN-INDUCED SURFACE PHASE-TRANSITIONS ON CR(110)
  ανά: Foord, J, κ.ά.
  Έκδοση: (1987)