THE CHARACTERIZATION OF SILICON SURFACES BY TIME-OF-FLIGHT ATOM PROBE ANALYSIS
New results are presented on the analysis of silicon surfaces in a Time-of-Flight Atom Probe. Comparison is made between the chemical data obtained from conventional voltage pulse and laser pulse desorption. © 1982.
Main Authors: | Grovenor, C, Smith, G |
---|---|
Format: | Journal article |
Language: | English |
Published: |
1982
|
Similar Items
-
INVESTIGATIONS OF METAL-SILICON INTERFACES BY TIME-OF-FLIGHT ATOM PROBE.
by: Grovenor, C, et al.
Published: (1983) -
SURFACE-ANALYSIS WITH A POSITION-SENSITIVE ATOM PROBE
by: Cerezo, A, et al.
Published: (1989) -
ATOM PROBE STUDIES OF THE COMPOSITION OF LOW-TEMPERATURE OXIDES ON (100) SILICON AND GALLIUM-ARSENIDE SURFACES
by: Grovenor, C, et al.
Published: (1989) -
PULSED LASER ATOM PROBE ANALYSIS OF SEMICONDUCTOR-MATERIALS
by: Cerezo, A, et al.
Published: (1986) -
PULSED LASER ATOM PROBE ANALYSIS OF GAAS AND INAS
by: Cerezo, A, et al.
Published: (1985)