On the diffusion behaviour of Os in the binary Ni-Os system
The diffusion of Os in Ni is characterised by measuring interdiffusion coefficients in the binary Ni-Os system, in the temperature range 1200-1350°C. The results are compared with data for Ni-Re. Theoretical calculations indicate that Os should display a diffusion coefficient comparable with Re, amo...
| Main Authors: | , , , |
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| Format: | Journal article |
| Language: | English |
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2010
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| _version_ | 1826277023617646592 |
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| author | Youssef, Y Lee, P Mills, K Reed, R |
| author_facet | Youssef, Y Lee, P Mills, K Reed, R |
| author_sort | Youssef, Y |
| collection | OXFORD |
| description | The diffusion of Os in Ni is characterised by measuring interdiffusion coefficients in the binary Ni-Os system, in the temperature range 1200-1350°C. The results are compared with data for Ni-Re. Theoretical calculations indicate that Os should display a diffusion coefficient comparable with Re, among the lowest displayed by elements from the d-block transition elements. The authors' experimental findings confirm these predictions, and suggest that alloying with Os is likely to improve the high temperature properties of the nickel-based superalloys. © 2010 Institute of Materials, Minerals and Mining. |
| first_indexed | 2024-03-06T23:22:39Z |
| format | Journal article |
| id | oxford-uuid:69437447-2556-408b-88b8-c36fc0bd9bd0 |
| institution | University of Oxford |
| language | English |
| last_indexed | 2024-03-06T23:22:39Z |
| publishDate | 2010 |
| record_format | dspace |
| spelling | oxford-uuid:69437447-2556-408b-88b8-c36fc0bd9bd02022-03-26T18:50:10ZOn the diffusion behaviour of Os in the binary Ni-Os systemJournal articlehttp://purl.org/coar/resource_type/c_dcae04bcuuid:69437447-2556-408b-88b8-c36fc0bd9bd0EnglishSymplectic Elements at Oxford2010Youssef, YLee, PMills, KReed, RThe diffusion of Os in Ni is characterised by measuring interdiffusion coefficients in the binary Ni-Os system, in the temperature range 1200-1350°C. The results are compared with data for Ni-Re. Theoretical calculations indicate that Os should display a diffusion coefficient comparable with Re, among the lowest displayed by elements from the d-block transition elements. The authors' experimental findings confirm these predictions, and suggest that alloying with Os is likely to improve the high temperature properties of the nickel-based superalloys. © 2010 Institute of Materials, Minerals and Mining. |
| spellingShingle | Youssef, Y Lee, P Mills, K Reed, R On the diffusion behaviour of Os in the binary Ni-Os system |
| title | On the diffusion behaviour of Os in the binary Ni-Os system |
| title_full | On the diffusion behaviour of Os in the binary Ni-Os system |
| title_fullStr | On the diffusion behaviour of Os in the binary Ni-Os system |
| title_full_unstemmed | On the diffusion behaviour of Os in the binary Ni-Os system |
| title_short | On the diffusion behaviour of Os in the binary Ni-Os system |
| title_sort | on the diffusion behaviour of os in the binary ni os system |
| work_keys_str_mv | AT youssefy onthediffusionbehaviourofosinthebinaryniossystem AT leep onthediffusionbehaviourofosinthebinaryniossystem AT millsk onthediffusionbehaviourofosinthebinaryniossystem AT reedr onthediffusionbehaviourofosinthebinaryniossystem |