Imbrici, P., Grottesi, A., D'Adamo, M., Mannucci, R., Tucker, S., & Pessia, M. (2009). Contribution of the central hydrophobic residue in the PXP motif of voltage-dependent K+ channels to S6 flexibility and gating properties.
Chicago Style aipamenaImbrici, P., A. Grottesi, M. D'Adamo, R. Mannucci, S. Tucker, and M. Pessia. Contribution of the Central Hydrophobic Residue in the PXP Motif of Voltage-dependent K+ Channels to S6 Flexibility and Gating Properties. 2009.
MLA aipamenaImbrici, P., et al. Contribution of the Central Hydrophobic Residue in the PXP Motif of Voltage-dependent K+ Channels to S6 Flexibility and Gating Properties. 2009.
Kontuz: berrikusi erreferentzia hauek erabili aurretik.